z-logo
open-access-imgOpen Access
Impact of thermal treatment on the growth of semipolar AlN on m-plane sapphire
Author(s) -
Masafumi Jo,
Naoki Morishita,
Narihito Okada,
Yuri Itokazu,
Norihiko Kamata,
Kazuyuki Tadatomo,
Hideki Hirayama
Publication year - 2018
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5052294
Subject(s) - sapphire , materials science , annealing (glass) , nitride , stacking , optoelectronics , transmission electron microscopy , composite material , layer (electronics) , nanotechnology , optics , chemistry , laser , physics , organic chemistry

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom