Open AccessElectron tunneling properties of Al2O3 tunnel barrier made using atomic layer deposition in multilayer devices
Author(s) -
Ryan Goul,
Jamie Wilt,
Jagaran Acharya,
Bo Liu,
Dan Ewing,
Matthew Casper,
Alex Stramel,
Alan Elliot,
Judy Wu
Publication year - 2019
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5052163
Subject(s) - atomic layer deposition , quantum tunnelling , materials science , surface roughness , tunnel junction , surface finish , barrier layer , deposition (geology) , optoelectronics , nanotechnology , layer (electronics) , composite material , paleontology , sediment , biology
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