Open AccessFacile process to clean PMMA residue on graphene using KrF laser annealing
Author(s) -
Hyeon Jun Hwang,
Yongsu Lee,
Chunhum Cho,
Byoung Hun Lee
Publication year - 2018
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5051671
Subject(s) - graphene , materials science , annealing (glass) , residue (chemistry) , laser , chemical engineering , optoelectronics , nanotechnology , composite material , optics , chemistry , organic chemistry , physics , engineering
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