Open AccessControl of boron diffusion from APCVD BSG layers by interface oxidation
Author(s) -
Sebastian Meier,
Sabrina Lohmüller,
Sebastian Mack,
Andreas Wolf,
Stefan W. Glunz
Publication year - 2018
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.5049302
Subject(s) - materials science , boron , passivation , sheet resistance , doping , oxygen , silicon , chemical vapor deposition , saturation current , analytical chemistry (journal) , diffusion , chemical engineering , layer (electronics) , optoelectronics , nanotechnology , chemistry , environmental chemistry , thermodynamics , physics , organic chemistry , quantum mechanics , voltage , engineering
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