Open AccessInterdigitated back contact silicon heterojunction solar cells: Towards an industrially applicable structuring method
Author(s) -
Philipp Wagner,
JohannChristoph Stang,
Mathias Mews,
Anna Belen MoralesVilches,
Bernd Stannowski,
Bert Stegemann,
Lars Korte
Publication year - 2018
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.5049299
Subject(s) - common emitter , optoelectronics , heterojunction , photolithography , shadow mask , materials science , silicon , shadow (psychology) , fabrication , solar cell , photovoltaic system , engineering physics , nanotechnology , computer science , engineering , electrical engineering , computer graphics (images) , medicine , psychology , alternative medicine , pathology , psychotherapist
We report on the investigation and comparison of two different processing approaches for interdigitated back contacted silicon heterojunction solar cells: our photolithography-based reference procedure and our newly developed shadow mask process. To this end, we analyse fill factor losses in different stages of the fabrication process. We find that although comparably high minority carrier lifetimes of about 4 ms can be observed for both concepts, the shadow masked solar cells suffer yet from poorly passivated emitter regions and significantly higher series resistance. Approaches for addressing the observed issues are outlined and first solar cell results with efficiencies of about 17 % and 23 % for shadow masked and photolithographically structured solar cells, respectively, are presented.
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