Open AccessTexturization of multicrystalline DWS wafers by HF/HNO3/H2SO4 at elevated temperature
Author(s) -
Katrin Krieg,
Niko Jenek,
Martin Zimmer
Publication year - 2018
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.5049294
Subject(s) - hydrofluoric acid , wafer , etching (microfabrication) , materials science , sulfuric acid , reflection (computer programming) , texture (cosmology) , nitric acid , silicon , diamond , spinel , composite material , analytical chemistry (journal) , mineralogy , metallurgy , optoelectronics , chemistry , layer (electronics) , image (mathematics) , chromatography , artificial intelligence , computer science , programming language
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