Open AccessRefractive index of PECVD-SiNy rear passivation films and its effect on assisted passivation of PERCs
Author(s) -
Supawan Joonwichien,
Yasuhiro Kida,
Masaaki Moriya,
Satoshi Utsunomiya,
Katsuhiko Shirasawa,
Hidetaka Takato
Publication year - 2018
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.5049292
Subject(s) - passivation , refractive index , plasma enhanced chemical vapor deposition , materials science , silicon , silicon nitride , optoelectronics , analytical chemistry (journal) , nanotechnology , chemistry , layer (electronics) , chromatography
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