Open AccessElectron-selective atomic-layer-deposited TiOx layers: Impact of post-deposition annealing and implementation into n-type silicon solar cells
Author(s) -
Valeriya Titova,
Dimitrij Startsev,
Jan Schmidt
Publication year - 2018
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.5049285
Subject(s) - passivation , materials science , annealing (glass) , silicon , atomic layer deposition , solar cell , optoelectronics , wafer , amorphous silicon , anatase , crystalline silicon , carrier lifetime , thermal stability , chemical engineering , nanotechnology , layer (electronics) , composite material , chemistry , biochemistry , photocatalysis , engineering , catalysis
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