Open AccessRealization of TOPCon using industrial scale PECVD equipment
Author(s) -
JanaIsabelle Polzin,
Frank Feldmann,
Bernd Steinhauser,
Martin Hermle,
Stefan W. Glunz
Publication year - 2018
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.5049281
Subject(s) - plasma enhanced chemical vapor deposition , passivation , materials science , realization (probability) , doping , layer (electronics) , oxide , optoelectronics , composite material , chemical vapor deposition , metallurgy , mathematics , statistics
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