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Improvement of the conductivity and surface passivation properties of boron-doped poly-silicon on oxide
Author(s) -
Audrey Morisset,
Raphaël Cabal,
Bernadette Grange,
Clément Marchat,
José Alvarez,
MarieEstelle GueunierFarret,
Sébastien Dubois,
JeanPaul Kleider
Publication year - 2018
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.5049280
Subject(s) - passivation , materials science , silicon , plasma enhanced chemical vapor deposition , annealing (glass) , chemical vapor deposition , conductivity , doping , oxide , boron , thin film , nanocrystalline silicon , silicon oxide , optoelectronics , layer (electronics) , chemical engineering , crystalline silicon , nanotechnology , composite material , metallurgy , amorphous silicon , chemistry , silicon nitride , organic chemistry , engineering

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