Open AccessEvidence of TiOx reduction at the SiOx/TiOx interface of passivating electron-selective contacts
Author(s) -
Jinyoun Cho,
Maarten Debucquoy,
María Recamán Payo,
Elie Schapmans,
Ivan Gordon,
Jozef Szlufcik,
Jef Poortmans
Publication year - 2018
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.5049268
Subject(s) - materials science , x ray photoelectron spectroscopy , band bending , stoichiometry , sputtering , doping , electron beam physical vapor deposition , oxygen , work function , layer (electronics) , analytical chemistry (journal) , nanotechnology , optoelectronics , chemical engineering , chemical vapor deposition , thin film , chemistry , organic chemistry , chromatography , engineering
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