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Evolution of structural topology of forming nanocrystalline silicon film by atomic-scale-mechanism-driven model based on realistic network
Author(s) -
Yixiong Zhang,
Hong Wang,
Shaoji Jiang
Publication year - 2018
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5048674
Subject(s) - nanocrystalline material , amorphous solid , materials science , atomic units , kinetic monte carlo , chemical physics , crystallization , physisorption , phase (matter) , topology (electrical circuits) , nanotechnology , monte carlo method , thermodynamics , crystallography , chemistry , physics , statistics , mathematics , organic chemistry , adsorption , quantum mechanics , combinatorics

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