Open AccessPulsed laser deposition of oxide thin films by the fifth harmonic of a Nd:Y3Al5O12 (Nd:YAG) laser
Author(s) -
Ryota Shimizu,
Issei Sugiyama,
Naoto Nakamura,
Shigeru Kobayashi,
Taro Hitosugi
Publication year - 2018
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5048441
Subject(s) - excimer laser , pulsed laser deposition , materials science , laser , epitaxy , thin film , optoelectronics , anatase , oxide , excimer , optics , nanotechnology , chemistry , layer (electronics) , metallurgy , biochemistry , physics , photocatalysis , catalysis
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