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Chemical vapor deposition of monolayer-thin WS2 crystals from the WF6 and H2S precursors at low deposition temperature
Author(s) -
Benjamin Groven,
D. Claes,
Ankit Nalin Mehta,
H. Bender,
Wilfried Vandervorst,
Marc Heyns,
Matty Caymax,
Iuliana Radu,
Annelies Delabie
Publication year - 2019
Publication title -
the journal of chemical physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.071
H-Index - 357
eISSN - 1089-7690
pISSN - 0021-9606
DOI - 10.1063/1.5048346
Subject(s) - monolayer , nucleation , chemical vapor deposition , layer (electronics) , amorphous solid , adsorption , thin film , crystal (programming language) , crystal growth , chemistry , deposition (geology) , chemical engineering , materials science , crystallography , chemical physics , nanotechnology , organic chemistry , computer science , programming language , paleontology , engineering , sediment , biology

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