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Si content variation and influence of deposition atmosphere in homoepitaxial Si-doped β-Ga2O3 films by pulsed laser deposition
Author(s) -
Kevin Leedy,
Kelson D. Chabak,
Vladimir Vasilyev,
D. C. Look,
K. Mahalingam,
Jeff L. Brown,
Andrew J. Green,
Cynthia T. Bowers,
Antonio Crespo,
Darren B. Thomson,
Gregg H. Jessen
Publication year - 2018
Publication title -
apl materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.571
H-Index - 60
ISSN - 2166-532X
DOI - 10.1063/1.5047214
Subject(s) - materials science , pulsed laser deposition , analytical chemistry (journal) , thin film , doping , dopant , chemical vapor deposition , electron mobility , electrical resistivity and conductivity , epitaxy , deposition (geology) , impurity , conductivity , nanotechnology , optoelectronics , chemistry , engineering , chromatography , layer (electronics) , sediment , electrical engineering , biology , organic chemistry , paleontology

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