Open AccessIn-plane-gate flexible single-crystalline silicon thin-film transistors with high-k gate dielectrics on plastic substrates
Author(s) -
Yibo Zhang,
Shihui Yu,
Kuibo Lan,
Lingxia Li,
Guoxuan Qin
Publication year - 2019
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5045521
Subject(s) - materials science , thin film transistor , optoelectronics , gate dielectric , dielectric , transistor , leakage (economics) , silicon , high κ dielectric , gate oxide , layer (electronics) , nanotechnology , electrical engineering , voltage , engineering , economics , macroeconomics
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