Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation | Zendy

Dimitrios Damianos | Zendy; G. Vitrant | Zendy; Anne KaminskiCachopo | Zendy; Danièle Blanc-Pélissier | Zendy; G. Ghibaudo | Zendy; Ming Lei | Zendy; J. Changala | Zendy; Aude Bouchard | Zendy; Xavier Mescot | Zendy; Martine Gri | Zendy; S. Cristoloveanu | Zendy; I. Ionica | Zendy

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Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation

Author(s) -

Dimitrios Damianos,

G. Vitrant,

Anne KaminskiCachopo,

Danièle Blanc-Pélissier,

G. Ghibaudo,

Ming Lei,

J. Changala,

Aude Bouchard,

Xavier Mescot,

Martine Gri,

S. Cristoloveanu,

I. Ionica

Publication year - 2018

Publication title -

journal of applied physics

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.699

H-Index - 319

eISSN - 1089-7550

pISSN - 0021-8979

DOI - 10.1063/1.5041062

Subject(s) - passivation , electric field , materials science , second harmonic generation , microwave , optoelectronics , oxide , capacitance , voltage , carrier lifetime , analytical chemistry (journal) , silicon , optics , layer (electronics) , chemistry , nanotechnology , electrical engineering , electrode , physics , laser , engineering , quantum mechanics , chromatography , metallurgy

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