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The thermal stability of epitaxial GeSn layers
Author(s) -
P. Zaumseil,
Yaonan Hou,
Markus Andreas Schubert,
Nils von den Driesch,
Daniela Stange,
Denis Rainko,
Michele Virgilio,
Dan Buca,
Giovanni Capellini
Publication year - 2018
Publication title -
apl materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.571
H-Index - 60
ISSN - 2166-532X
DOI - 10.1063/1.5036728
Subject(s) - materials science , annealing (glass) , epitaxy , heterojunction , condensed matter physics , stress relaxation , thermal stability , relaxation (psychology) , lattice (music) , chemical physics , optoelectronics , nanotechnology , chemical engineering , composite material , layer (electronics) , psychology , social psychology , creep , physics , acoustics , engineering
We report on the direct observation of lattice relaxation and Sn segregation of GeSn/Ge/Si heterostructures under annealing. We investigated strained and partially relaxed epi-layers with Sn content in the 5 at. %-12 at. % range. In relaxed samples, we observe a further strain relaxation followed by a sudden Sn segregation, resulting in the separation of a β-Sn phase. In pseudomorphic samples, a slower segregation process progressively leads to the accumulation of Sn at the surface only. The different behaviors are explained by the role of dislocations in the Sn diffusion process. The positive impact of annealing on optical emission is also discussed.We report on the direct observation of lattice relaxation and Sn segregation of GeSn/Ge/Si heterostructures under annealing. We investigated strained and partially relaxed epi-layers with Sn content in the 5 at. %-12 at. % range. In relaxed samples, we observe a further strain relaxation followed by a sudden Sn segregation, resulting in the separation of a β-Sn phase. In pseudomorphic samples, a slower segregation process progressively leads to the accumulation of Sn at the surface only. The different behaviors are explained by the role of dislocations in the Sn diffusion process. The positive impact of annealing on optical emission is also discussed.

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