Open AccessWafer-scale epitaxial germanium (100), (111), (110) films on silicon using liquid phase crystallization
Author(s) -
Saloni Chaurasia,
Nagaboopathy Mohan,
Srinivasan Raghavan,
Sushobhan Avasthi
Publication year - 2018
Publication title -
aip advances
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5033324
Subject(s) - germanium , epitaxy , materials science , crystallization , wafer , silicon , crystallography , amorphous solid , optoelectronics , analytical chemistry (journal) , layer (electronics) , nanotechnology , chemistry , organic chemistry , chromatography
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