Open AccessMulti-scale structure patterning by digital-mask projective lithography with an alterable projective scaling system
Author(s) -
Yuhuan Liu,
Yuanyuan Zhao,
XianZi Dong,
MeiLing Zheng,
Feng Jin,
Jie Liu,
XuanMing Duan,
ZhenSheng Zhao
Publication year - 2018
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5030585
Subject(s) - digital micromirror device , lithography , optics , scaling , photomask , numerical aperture , maskless lithography , materials science , lens (geology) , femtosecond , fabrication , computer science , physics , laser , electron beam lithography , resist , nanotechnology , geometry , mathematics , wavelength , medicine , alternative medicine , layer (electronics) , pathology
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