Open AccessLow contact resistance of NiGe/p-Ge by indium segregation during Ni germanidation
Author(s) -
Meng Li,
Geonyeong Shin,
J. Lee,
Jungwoo Oh,
HaeDong Lee
Publication year - 2018
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5029858
Subject(s) - contact resistance , indium , germanide , materials science , annealing (glass) , germanium , metallurgy , alloy , oxide , doping , electrical resistivity and conductivity , metal , nickel , silicon , layer (electronics) , composite material , optoelectronics , electrical engineering , engineering
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