Open AccessA new stable, crystalline capping material for topological insulators
Author(s) -
H. Y. Lin,
C. K. Cheng,
K. H. M. Chen,
C. C. Tseng,
S. W. Huang,
Ming-Hsiung Chang,
S. Tseng,
Minghwei Hong,
J. Kwo
Publication year - 2018
Publication title -
apl materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.571
H-Index - 60
ISSN - 2166-532X
DOI - 10.1063/1.5029706
Subject(s) - materials science , amorphous solid , topological insulator , layer (electronics) , photoemission spectroscopy , degradation (telecommunications) , x ray photoelectron spectroscopy , topology (electrical circuits) , chemical engineering , spectroscopy , nanotechnology , crystallography , condensed matter physics , chemistry , electronic engineering , physics , mathematics , combinatorics , quantum mechanics , engineering
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