The effect of V/III ratio on the morphology and structure of GaAs nanowires by MOCVD
Author(s) -
Yan Liu,
Yan Peng,
Jingwei Guo,
DongSheng La,
Zhaopeng Xu
Publication year - 2018
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5028350
Subject(s) - nanowire , metalorganic vapour phase epitaxy , chemical vapor deposition , materials science , substrate (aquarium) , vapor–liquid–solid method , catalysis , morphology (biology) , nanotechnology , deposition (geology) , metal , chemical engineering , epitaxy , optoelectronics , chemistry , layer (electronics) , metallurgy , organic chemistry , paleontology , oceanography , sediment , geology , biology , engineering , genetics
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