Open AccessHigh performance top gate a-IGZO TFT utilizing siloxane hybrid material as a gate insulator
Author(s) -
Chaiyanan Kulchaisit,
Juan Paolo Bermundo,
Mami N. Fujii,
Yasuaki Ishikawa,
Yukiharu Uraoka
Publication year - 2018
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5027276
Subject(s) - materials science , siloxane , thin film transistor , fabrication , optoelectronics , insulator (electricity) , coating , nanotechnology , layer (electronics) , composite material , polymer , medicine , alternative medicine , pathology
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