Design of a patterned nanostructure array using a nanosecond pulsed laser

For design the patterned nanostructure array (PNSA) on material surface using a nanosecond pulsed laser, we investigated the influence of phase shift between scattered lights on silicon (Si) substrate using 30-nm-wide gold lines (GLs) spacings. At a spacing of 5,871 nm, ten nanodot (ND) arrays were formed at intervals of 533 nm by nanosecond pulsed laser. The results show that the formation of the PNSA was affected by the resonance of scattered light. We conclude that ND arrays were formed with a spacing of Λ = nλ. And we have designed PNSA comprising two ND arrays on the substrate. The PNSA with dimensions of 1,600 nm × 1,600 nm was prepared using GLs.For design the patterned nanostructure array (PNSA) on material surface using a nanosecond pulsed laser, we investigated the influence of phase shift between scattered lights on silicon (Si) substrate using 30-nm-wide gold lines (GLs) spacings. At a spacing of 5,871 nm, ten nanodot (ND) arrays were formed at intervals of 533 nm by nanosecond pulsed laser. The results show that the formation of the PNSA was affected by the resonance of scattered light. We conclude that ND arrays were formed with a spacing of Λ = nλ. And we have designed PNSA comprising two ND arrays on the substrate. The PNSA with dimensions of 1,600 nm × 1,600 nm was prepared using GLs.