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Valence change detection in memristive oxide based heterostructure cells by hard X-ray photoelectron emission spectroscopy
Author(s) -
Andreas Kindsmüller,
Christoph Schmitz,
C. Wiemann,
Katharina Skaja,
Dirk J. Wouters,
Rainer Waser,
Claus M. Schneider,
Regina Dittmann
Publication year - 2018
Publication title -
apl materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.571
H-Index - 60
ISSN - 2166-532X
DOI - 10.1063/1.5026063
Subject(s) - x ray photoelectron spectroscopy , materials science , valence (chemistry) , electroforming , heterojunction , oxide , electrode , resistive random access memory , optoelectronics , analytical chemistry (journal) , nanotechnology , chemistry , chemical engineering , layer (electronics) , organic chemistry , chromatography , engineering , metallurgy
The switching mechanism of valence change resistive memory devices is widely accepted to be an ionic movement of oxygen vacancies resulting in a valence change of the metal cations. However, direct experimental proofs of valence changes in memristive devices are scarce. In this work, we have employed hard X-ray photoelectron emission microscopy (PEEM) to probe local valence changes in Pt/ZrOx/Ta memristive devices. The use of hard X-ray radiation increases the information depth, thus providing chemical information from buried layers. By extracting X-ray photoelectron spectra from different locations in the PEEM images, we show that zirconia in the active device area is reduced compared to a neighbouring region, confirming the valence change in the ZrOx film during electroforming. Furthermore, we succeeded in measuring the Ta 4f spectrum for two different resistance states on the same device. In both states, as well as outside the device region, the Ta electrode is composed of different suboxides without a...

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