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Improving the photoresponse spectra of BaSi2 layers by capping with hydrogenated amorphous Si layers prepared by radio-frequency hydrogen plasma
Author(s) -
Zhihao Xu,
Kazuhiro Gotoh,
Tianguo Deng,
Takuma Sato,
Ryota Takabe,
Kaoru Toko,
Noritaka Usami,
Takashi Suemasu
Publication year - 2018
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5025021
Subject(s) - passivation , materials science , amorphous solid , silicon , substrate (aquarium) , hydrogen , amorphous silicon , layer (electronics) , molecular beam epitaxy , analytical chemistry (journal) , evaporation , electron beam physical vapor deposition , optoelectronics , chemical vapor deposition , epitaxy , nanotechnology , crystalline silicon , chemistry , crystallography , oceanography , organic chemistry , physics , chromatography , geology , thermodynamics

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