z-logo
open-access-imgOpen Access
Fabrication and characterization of uniaxially strained SOI with wafer level by mechanical bending and annealing
Author(s) -
Shujing Wu,
Dongming Miao,
Xianying Dai,
Chenfeng Shao,
Yue Hao
Publication year - 2018
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5024444
Subject(s) - materials science , silicon on insulator , wafer , raman spectroscopy , fabrication , annealing (glass) , optoelectronics , crystallinity , tetragonal crystal system , silicon , composite material , optics , crystallography , crystal structure , medicine , chemistry , physics , alternative medicine , pathology

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom