Modeling the characteristic etch morphologies along specific crystallographic orientations by anisotropic chemical etching
Author(s) -
KunDar Li,
Jin-Ru Miao
Publication year - 2018
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5021721
Subject(s) - etching (microfabrication) , isotropic etching , hillock , anisotropy , materials science , nanotechnology , isotropy , chemical physics , crystallography , chemistry , composite material , optics , layer (electronics) , physics
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