Lifetime laser damage performance of β-Ga2O3 for high power applications
Author(s) -
JaeHyuck Yoo,
Subrina Rafique,
Andrew Lange,
Hongping Zhao,
Selim Elhadj
Publication year - 2018
Publication title -
apl materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.571
H-Index - 60
ISSN - 2166-532X
DOI - 10.1063/1.5021603
Subject(s) - materials science , gallium nitride , optoelectronics , wide bandgap semiconductor , silicon carbide , gallium arsenide , raman spectroscopy , laser , semiconductor , power semiconductor device , gallium , band gap , nanotechnology , power (physics) , optics , composite material , physics , layer (electronics) , quantum mechanics , metallurgy
Gallium oxide (Ga2O3) is an emerging wide bandgap semiconductor with potential applications in power electronics and high power optical systems where gallium nitride and silicon carbide have already demonstrated unique advantages compared to gallium arsenide and silicon-based devices. Establishing the stability and breakdown conditions of these next-generation materials is critical to assessing their potential performance in devices subjected to large electric fields. Here, using systematic laser damage performance tests, we establish that β-Ga2O3 has the highest lifetime optical damage performance of any conductive material measured to date, above 10 J/cm2 (1.4 GW/cm2). This has direct implications for its use as an active component in high power laser systems and may give insight into its utility for high-power switching applications. Both heteroepitaxial and bulk β-Ga2O3 samples were benchmarked against a heteroepitaxial gallium nitride sample, revealing an order of magnitude higher optical lifetime da...
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