Post deposition annealing effect on the properties of Al2O3/InP interface
Author(s) -
Hogyoung Kim,
Dong Ha Kim,
Byung Joon Choi
Publication year - 2018
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5019856
Subject(s) - annealing (glass) , photoluminescence , materials science , indium , oxygen , analytical chemistry (journal) , indium phosphide , optoelectronics , chemistry , gallium arsenide , composite material , organic chemistry , chromatography
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