Influence of substrate on structural, morphological and optical properties of TiO2thin films deposited by reaction magnetron sputtering
Author(s) -
Xinghua Zhu,
Peng Gu,
Haihua Wu,
Dingyu Yang,
Hui Sun,
Peihua Wangyang,
Jitao Li,
Haibo Tian
Publication year - 2017
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5017242
Subject(s) - materials science , anatase , photoluminescence , raman spectroscopy , sputter deposition , thin film , rutile , substrate (aquarium) , sputtering , luminescence , silicon , analytical chemistry (journal) , titanium , titanium dioxide , platinum , mineralogy , chemical engineering , optoelectronics , nanotechnology , optics , photocatalysis , composite material , metallurgy , chemistry , catalysis , biochemistry , physics , engineering , oceanography , chromatography , geology
Titanium dioxide (TiO2) films have been prepared by DC reaction magnetron sputtering technique on different substrates (glass, SiO2, platinum electrode-Pt, Silicon-Si). X-ray diffraction (XRD) patterns showed that all TiO2 films were grown along the preferred orientation of (110) plane. Samples on Si and Pt substrates are almost monophasic rutile, however, samples on glass and SiO2 substrates accompanied by a weak anatase structure. Atomic force microscopy (AFM) images revealed uniform grain distribution except for films on Pt substrates. Photoluminescence (PL) spectra showed obvious intrinsic emission band, but films on glass was accompanied by a distinct defect luminescence region. Raman spectroscopy suggested that all samples moved to high wavenumbers and films on glass moved obviously
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