Open AccessControlling the formation and stability of ultra-thin nickel silicides - An alloying strategy for preventing agglomeration
Author(s) -
Filip Geenen,
K. van Stiphout,
A Nanakoudis,
Sara Bals,
André Vantomme,
Jean Jordan-Sweet,
C. Lavoie,
Christophe Detavernier
Publication year - 2018
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.5009641
Subject(s) - materials science , silicide , annealing (glass) , nucleation , salicide , economies of agglomeration , crystallite , thin film , epitaxy , metallurgy , ternary operation , nanotechnology , optoelectronics , chemical engineering , silicon , layer (electronics) , chemistry , computer science , engineering , programming language , organic chemistry