Open AccessA sensitive EUV Schwarzschild microscope for plasma studies with sub-micrometer resolution
Author(s) -
U. Zastrau,
Christian Rödel,
M. Nakatsutsumi,
Torsten Feigl,
Karen Appel,
B. Chen,
T. Döppner,
Thomas Fennel,
Tobias Fiedler,
L. B. Fletcher,
E. Förster,
E. J. Gamboa,
Dirk O. Gericke,
S. Göde,
C. Grote-Fortmann,
V. Hilbert,
Lev Kazak,
Tim Laarmann,
H. J. Lee,
P. Mabey,
Franklin Martinez,
KarlHeinz MeiwesBroer,
Hagen Pauer,
Marco Perske,
Andreas Przystawik,
Sebastian Roling,
Slawomir Skruszewicz,
Mohammed Shihab,
J. Tiggesbäumker,
S. Toleikis,
Martin Wünsche,
H. Zacharias,
S. H. Glenzer,
G. Gregori
Publication year - 2018
Publication title -
review of scientific instruments online/review of scientific instruments
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.605
H-Index - 165
eISSN - 1089-7623
pISSN - 0034-6748
DOI - 10.1063/1.5007950
Subject(s) - extreme ultraviolet lithography , optics , materials science , extreme ultraviolet , micrometer , laser , microscope , plasma , resolution (logic) , physics , quantum mechanics , artificial intelligence , computer science