A sensitive EUV Schwarzschild microscope for plasma studies with sub-micrometer resolution | Zendy

U. Zastrau | Zendy; Christian Rödel | Zendy; M. Nakatsutsumi | Zendy; Torsten Feigl | Zendy; Karen Appel | Zendy; B. Chen | Zendy; T. Döppner | Zendy; Thomas Fennel | Zendy; Tobias Fiedler | Zendy; L. B. Fletcher | Zendy; E. Förster | Zendy; E. J. Gamboa | Zendy; D. O. Gericke | Zendy; S. Göde | Zendy; C. Grote-Fortmann | Zendy; Vinzenz Hilbert | Zendy; Lev Kazak | Zendy; Tim Laarmann | Zendy; Hae Ja Lee | Zendy; P. Mabey | Zendy; Franklin Martinez | Zendy; K.H. MeiwesBroer | Zendy; Hagen Pauer | Zendy; Marco Perske | Zendy; Andreas Przystawik | Zendy; Sebastian Roling | Zendy; Sławomir Skruszewicz | Zendy; Mohammed Shihab | Zendy; J. Tiggesbäumker | Zendy; S. Toleikis | Zendy; Martin Wünsche | Zendy; H. Zacharias | Zendy; S. H. Glenzer | Zendy; G. Gregori | Zendy

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A sensitive EUV Schwarzschild microscope for plasma studies with sub-micrometer resolution

Author(s) -

U. Zastrau,

Christian Rödel,

M. Nakatsutsumi,

Torsten Feigl,

Karen Appel,

B. Chen,

T. Döppner,

Thomas Fennel,

Tobias Fiedler,

L. B. Fletcher,

E. Förster,

E. J. Gamboa,

D. O. Gericke,

S. Göde,

C. Grote-Fortmann,

Vinzenz Hilbert,

Lev Kazak,

Tim Laarmann,

Hae Ja Lee,

P. Mabey,

Franklin Martinez,

K.H. MeiwesBroer,

Hagen Pauer,

Marco Perske,

Andreas Przystawik,

Sebastian Roling,

Sławomir Skruszewicz,

Mohammed Shihab,

J. Tiggesbäumker,

S. Toleikis,

Martin Wünsche,

H. Zacharias,

S. H. Glenzer,

G. Gregori

Publication year - 2018

Publication title -

review of scientific instruments

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.605

H-Index - 165

eISSN - 1089-7623

pISSN - 0034-6748

DOI - 10.1063/1.5007950

Subject(s) - extreme ultraviolet lithography , optics , materials science , extreme ultraviolet , micrometer , laser , microscope , plasma , resolution (logic) , physics , quantum mechanics , artificial intelligence , computer science

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