Co-based amorphous thin films on silicon with soft magnetic properties
Author(s) -
Ansar Masood,
Paul McCloskey,
Cian Ó Mathúna,
Santosh Kulkarni
Publication year - 2017
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5007733
Subject(s) - materials science , amorphous solid , ferromagnetic resonance , sputter deposition , thin film , magnetic hysteresis , amorphous silicon , permeability (electromagnetism) , hysteresis , nuclear magnetic resonance , silicon , ferromagnetism , sputtering , magnetostriction , condensed matter physics , optoelectronics , magnetic field , magnetization , nanotechnology , crystallography , chemistry , crystalline silicon , physics , biochemistry , quantum mechanics , membrane
The present work investigates the emergence of multiple modes in the high-frequency permeability spectrum of Co-Zr-Ta-B amorphous thin films. Amorphous thin films of different thicknesses (t=100-530 nm) were deposited by DC magnetron sputtering. Their static and dynamic soft magnetic properties were investigated to explore the presence of multi-magnetic phases in the films. A two-phase magnetic behavior of the thicker films (≥333 nm) was revealed by the in-plane hysteresis loops. Multiple resonance peaks were observed in the high-frequency permeability spectrum of the thicker films. The thickness dependent multiple resonance peaks below the main ferromagnetic resonance (FMR) can be attributed to the two-phase magnetic behaviors of the films.
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