z-logo
open-access-imgOpen Access
Fabrication of Mg-X-O (X = Fe, Co, Ni, Cr, Mn, Ti, V, and Zn) barriers for magnetic tunnel junctions
Author(s) -
Kay Yakushiji,
E. Kitagawa,
Takao Ochiai,
Hitoshi Kubota,
N. Shimomura,
Junichi Ito,
H. Yoda,
Shinji Yuasa
Publication year - 2017
Publication title -
aip advances
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5006099
Subject(s) - microstructure , materials science , dopant , magnetoresistance , doping , transition metal , tunnel magnetoresistance , manganese , metallurgy , analytical chemistry (journal) , crystallography , nanotechnology , chemistry , magnetic field , catalysis , layer (electronics) , optoelectronics , biochemistry , physics , quantum mechanics , chromatography

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom