Fabrication of Mg-X-O (X = Fe, Co, Ni, Cr, Mn, Ti, V, and Zn) barriers for magnetic tunnel junctions
Author(s) -
Kay Yakushiji,
E. Kitagawa,
Takao Ochiai,
Hitoshi Kubota,
N. Shimomura,
Junichi Ito,
H. Yoda,
Shinji Yuasa
Publication year - 2017
Publication title -
aip advances
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5006099
Subject(s) - microstructure , materials science , dopant , magnetoresistance , doping , transition metal , tunnel magnetoresistance , manganese , metallurgy , analytical chemistry (journal) , crystallography , nanotechnology , chemistry , magnetic field , catalysis , layer (electronics) , optoelectronics , biochemistry , physics , quantum mechanics , chromatography
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