Open AccessTwo-dimensional simulations of multi-hollow VHF SiH4/H2 plasma
Author(s) -
Li-Wen Su,
Weiting Chen,
Kiichiro Uchino,
Yoshinobu Kawai
Publication year - 2018
Publication title -
aip advances
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5003911
Subject(s) - triode , plasma , electron density , electron temperature , electrode , substrate (aquarium) , electron , plasma parameter , silicon , atomic physics , materials science , plasma parameters , amorphous silicon , plasma diagnostics , analytical chemistry (journal) , chemistry , optoelectronics , voltage , physics , capacitor , crystalline silicon , oceanography , chromatography , quantum mechanics , geology
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