Porous single crystalline 4H silicon carbide rugate mirrors
Author(s) -
Markus Leitgeb,
Christopher Zellner,
Michael Schneider,
U. Schmid
Publication year - 2017
Publication title -
apl materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.571
H-Index - 60
ISSN - 2166-532X
DOI - 10.1063/1.5001876
Subject(s) - materials science , etching (microfabrication) , porosity , silicon carbide , fabrication , refractive index , porous silicon , optoelectronics , carbide , reflection (computer programming) , dry etching , optics , silicon , composite material , medicine , alternative medicine , physics , pathology , layer (electronics) , computer science , programming language
Porous 4H silicon carbide optical rugate mirrors have been fabricated with a combination of metal assisted photochemical etching and photoelectrochemical etching. The degree of porosity was controlled by the applied voltage, while the etching depth was controlled by measuring the transferred charge. The resulting degree of porosity as well as the refractive index profile could be estimated with image processing, thus enabling the prediction of the peak position in the reflection spectrum of the mirrors. Furthermore the presented method allows the re-use of the 4H–SiC bulk sample for subsequent mirror fabrication
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom