Photoelectron emission experiments with ECR-driven multi-dipolar negative ion plasma source | Zendy

J. Laulainen | Zendy; T. Kalvas | Zendy; H. Koivisto | Zendy; R. Kronholm | Zendy; O. Tarvainen | Zendy; S. Aleiferis | Zendy; P. Svarnas | Zendy

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Photoelectron emission experiments with ECR-driven multi-dipolar negative ion plasma source

Author(s) -

J. Laulainen,

T. Kalvas,

H. Koivisto,

R. Kronholm,

O. Tarvainen,

S. Aleiferis,

P. Svarnas

Publication year - 2017

Publication title -

aip conference proceedings

Language(s) - English

Resource type - Conference proceedings

eISSN - 1551-7616

pISSN - 0094-243X

DOI - 10.1063/1.4995718

Subject(s) - plasma , x ray photoelectron spectroscopy , atomic physics , materials science , hydrogen , microwave , ion source , analytical chemistry (journal) , ion , chemistry , nuclear magnetic resonance , physics , organic chemistry , quantum mechanics , chromatography

Photoelectron emission measurements have been performed using a 2.45 GHz ECR-driven multi-dipolar plasma source in a low pressure hydrogen discharge. Photoelectron currents induced by light emitted from ECR zone and H− production region are measured from Al, Cu, Mo, Ta, and stainless steel (SAE 304) surfaces as a function of microwave power and neutral hydrogen pressure. The total photoelectron current from the plasma chamber wall is estimated to reach values up to 1 A for 900 W of injected microwave power. It is concluded that the volumetric photon emission rate in wavelength range relevant for photoelectron emission is a few times higher in arc discharge.

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