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Ambipolar field-effect transistors by few-layer InSe with asymmetry contact metals
Author(s) -
ChangYu Lin,
Rajesh Kumar Ulaganathan,
Raman Sankar,
F. C. Chou
Publication year - 2017
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.4995589
Subject(s) - ambipolar diffusion , materials science , semiconductor , field effect transistor , optoelectronics , schottky barrier , transistor , schottky diode , photovoltaic effect , nanotechnology , electron , photovoltaic system , diode , electrical engineering , physics , quantum mechanics , voltage , engineering
Group IIIA−VIA layered semiconductors (MX, where M = Ga and In, X = S, Se, and Te) have attracted tremendous interest for their anisotropic optical, electronic, and mechanical properties. In this study, we demonstrated that metal and InSe junctions can lead to carrier behaviors in few-layered InSe FETs. These results indicate that the polarity of few-layered InSe FETs can be determined by using metals with different work functions. We adopted FET S/D metal contacts with asymmetric work functions to reduce the Schottky barriers of electrons and holes, and discovered that few-layered InSe FETs with carefully selected metal contacts can achieve ambipolar behaviors. These results indicate that group IIIA−VIA layered semiconductor FETs with asymmetry contact metals have great potential for applications in photovoltaic devices, optical sensors, and CMOS inverter circuits

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