Electronic structure, excitation properties, and chemical transformations of extreme ultra-violet resist materials | Zendy

Sylvie Rangan | Zendy; R. A. Bartynski | Zendy; Amrit Narasimhan | Zendy; Robert L. Brainard | Zendy

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Electronic structure, excitation properties, and chemical transformations of extreme ultra-violet resist materials

Author(s) -

Sylvie Rangan,

R. A. Bartynski,

Amrit Narasimhan,

Robert L. Brainard

Publication year - 2017

Publication title -

journal of applied physics

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.699

H-Index - 319

eISSN - 1089-7550

pISSN - 0021-8979

DOI - 10.1063/1.4992083

Subject(s) - resist , x ray photoelectron spectroscopy , irradiation , polymer , electronic structure , materials science , electron energy loss spectroscopy , reactivity (psychology) , chemical physics , spectroscopy , photoemission spectroscopy , chemistry , photochemistry , nanotechnology , chemical engineering , computational chemistry , transmission electron microscopy , physics , composite material , medicine , alternative medicine , layer (electronics) , pathology , quantum mechanics , nuclear physics , engineering

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