Angular distribution of hybridization in sputtered carbon thin film | Zendy

Y. Liu | Zendy; H. Wang | Zendy; Zhong Wei | Zendy

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Angular distribution of hybridization in sputtered carbon thin film

Author(s) -

Y. Liu,

H. Wang,

Zhong Wei

Publication year - 2017

Publication title -

aip advances

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.421

H-Index - 58

ISSN - 2158-3226

DOI - 10.1063/1.4990858

Subject(s) - x ray photoelectron spectroscopy , thin film , materials science , carbon fibers , permittivity , sputter deposition , analytical chemistry (journal) , ion , cavity magnetron , deposition (geology) , spectral line , sputtering , percolation (cognitive psychology) , molecular physics , atomic physics , dielectric , chemistry , nuclear magnetic resonance , optoelectronics , nanotechnology , composite material , physics , chromatography , composite number , paleontology , organic chemistry , astronomy , neuroscience , sediment , biology

The sp3/sp2 ratio of sputtered carbon thin film depends on the ion bombardment process and tailors the physical properties of carbon thin film. In present work, we report the angular distribution of hybridization in magnetron sputtered carbon thin film for the first time. By x-ray photoelectron spectra analyses, it is found that the sp3/sp2 ratio increases linearly with increasing the deposition angle from 0 to 90 degree, which could be attributed to the enhancement of direct knocking-out of near-surface target atoms. In addition, we also derive the sp3/sp2 ratio by simulation on complex permittivity in terahertz frequency using a modified percolation approximation tunneling model. Those derived data consist with the results from x-ray photoelectron spectroscopy

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