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Behaviors of beryllium compensation doping in InGaAsP grown by gas source molecular beam epitaxy
Author(s) -
Y. J.,
Yonggang Zhang,
Yi Gu,
S. P. Xi,
XiaoYa Chen,
Baolai Liang,
BorChau Juang,
Diana L. Huffaker,
Binyang Du,
Xiumei Shao,
J.X. Fang
Publication year - 2017
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.4989884
Subject(s) - molecular beam epitaxy , doping , beryllium , photoluminescence , materials science , passivation , hall effect , analytical chemistry (journal) , optoelectronics , epitaxy , chemistry , electrical resistivity and conductivity , nanotechnology , engineering , chromatography , organic chemistry , layer (electronics) , electrical engineering
We report structural properties as well as electrical and optical behaviors of beryllium (Be)-doped InGaAsP lattice-matched to InP grown by gas source molecular beam epitaxy. P type layers present a high degree of compensation on the order of 1018 cm−3, and for Be densities below 9.5×1017 cm−3, they are found to be n type. Enhanced incorporation of oxygen during Be doping is observed by secondary ion mass spectroscopy. Be in forms of interstitial donors or donor-like Be-O complexes for cell temperatures below 800°C is proposed to account for such anomalous compensation behaviors. A constant photoluminescence energy of 0.98 eV without any Moss-Burstein shift for Be doping levels up to 1018 cm−3 along with increased emission intensity due to passivation effect of Be is also observed. An increasing number of minority carriers tend to relax via Be defect state-related Shockley-Read-Hall recombination with the increase of Be doping density

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