Open AccessErratum: “NiSi crystal structure, site preference, and partitioning behavior of palladium in NiSi(Pd)/Si(100) thin films: Experiments and calculations” [Appl. Phys. Lett. 99, 013106 (2011)]
Author(s) -
Zugang Mao,
Yeong-Cheol Kim,
Hi-Deok Lee,
Praneet Adusumilli,
David N. Seidman
Publication year - 2017
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.4986785
Subject(s) - palladium , materials science , thin film , preference , crystal structure , crystallography , germanium compounds , condensed matter physics , nanotechnology , silicon , chemistry , physics , optoelectronics , catalysis , germanium , mathematics , organic chemistry , statistics
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom