z-logo
open-access-imgOpen Access
Microstructure evolution of polycrystalline silicon by molecular dynamics simulation
Author(s) -
Xiaohong Chen,
Jianning Ding,
Cunhua Jiang,
Zunfeng Liu,
Ningyi Yuan
Publication year - 2017
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.4984234
Subject(s) - silicon , materials science , polycrystalline silicon , nanocrystalline silicon , microstructure , wafer , crystallite , crystallization , crystalline silicon , monocrystalline silicon , nanotechnology , optoelectronics , composite material , metallurgy , chemical engineering , amorphous silicon , thin film transistor , layer (electronics) , engineering
Polycrystalline silicon is the dominant material in solar cells and plays an important role in photovoltaic industry. It is important for not only the conventional production of silicon ingots but also the direct growth of silicon wafers to control crystallization for obtaining the desired polycrystalline silicon. To the best of our knowledge, few studies have systematically reported about the effects of crystalline planes on the solidification behavior of liquid silicon and the analysis of the microstructural features of the polysilicon structure. In this study, molecular dynamics simulations were employed to investigate the solidification and microstructure evolution of polysilicon, with focus on the effects of the seed distribution and cooling rate on the growth of polycrystalline silicon. The (110), (111), and (112) planes were extruded by the (100) plane and formed the inclusion shape. The crystallization of silicon consisted of diamond-type structures is relatively high at a low cooling rate. The simulations provide substantial information regarding microstructures and serve as guidance for the growth of polycrystalline silicon

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom