Open AccessMicrostructure and properties of atmospheric pressure chemical vapor deposition of tungsten carbide
Author(s) -
Huicong Zhang,
Chengwen Tan,
Xiaodong Yu,
Honglei Ma,
Huaijian Cai,
Fang Wang
Publication year - 2017
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.4982439
Subject(s) - tungsten , tungsten carbide , materials science , chemical vapor deposition , coating , scanning electron microscope , tungsten trioxide , microstructure , carbide , deposition (geology) , atmospheric pressure , layer (electronics) , lamellar structure , metallurgy , chemical engineering , composite material , nanotechnology , engineering , paleontology , oceanography , sediment , geology , biology
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