Open AccessPreface to Special Topic: Reactive high power impulse magnetron sputtering
Author(s) -
Ante Hećimović,
Jón Tómas Guðmundsson
Publication year - 2017
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.4979270
Subject(s) - high power impulse magnetron sputtering , sputter deposition , cavity magnetron , sputtering , impulse (physics) , materials science , engineering physics , physics , nanotechnology , thin film , classical mechanics
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