Suppression of conductivity deterioration of copper thin films by coating with atomic-layer materials | Zendy

Nguyen Thanh Cuong | Zendy; Susumu Okada | Zendy

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Suppression of conductivity deterioration of copper thin films by coating with atomic-layer materials

Author(s) -

Nguyen Thanh Cuong,

Susumu Okada

Publication year - 2017

Publication title -

applied physics letters

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.182

H-Index - 442

eISSN - 1077-3118

pISSN - 0003-6951

DOI - 10.1063/1.4979038

Subject(s) - boron nitride , materials science , graphene , copper , thin film , conductivity , layer (electronics) , coating , surface conductivity , electrical resistivity and conductivity , boron , electron , nitride , composite material , nanotechnology , metallurgy , chemistry , physics , engineering , organic chemistry , quantum mechanics , electrical engineering

Theoretical calculations are performed to explore the electronic structures and electron conducting properties of copper (Cu) thin films coated with graphene or h-boron-nitride (h-BN) layers. The Shockley surface states of Cu surfaces are preserved by the graphene and h-BN coatings which prevent the surface oxidation of Cu because of the weak interaction between the Cu surface and graphene or the h-BN layers. Furthermore, the Shockley surface states in Cu thin films possess quasi-two dimensional free-electron characteristics and exhibit a high conductivity of 1.62 × 107 (Ωm)−1 at room temperature. These hybrid structures may be suitable as interconnects in memory devices that can stably store data for long periods

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