Open AccessTutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS)
Author(s) -
André Anders
Publication year - 2017
Publication title -
journal of applied physics
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.4978350
Subject(s) - high power impulse magnetron sputtering , sputtering , sputter deposition , materials science , plasma , cavity magnetron , optoelectronics , thin film , chemistry , nanotechnology , physics , quantum mechanics
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