Open AccessMagnetic anisotropy of epitaxial Co2Fe-Ge Heusler alloy films on MgO (100) substrates
Author(s) -
A. M. Pogorily,
A. F. Kravets,
V. V. Nevdacha,
D. Y. Podyalovskiy,
S. M. Ryabchenko,
В. М. Каліта,
M. Kulik,
A. F. Lozenko,
A. Vovk,
M. Godinho,
Laura Maurel,
J. A. Pardo,
César Magén,
V. Korenivski
Publication year - 2017
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.4978209
Subject(s) - materials science , magnetic anisotropy , epitaxy , condensed matter physics , ferromagnetic resonance , alloy , anisotropy , sputter deposition , magnetometer , microstructure , ferromagnetism , monocrystalline silicon , sputtering , layer (electronics) , thin film , nuclear magnetic resonance , metallurgy , silicon , nanotechnology , magnetic field , optics , magnetization , physics , quantum mechanics
Films of Co2Fe-Ge Heusler alloy with variable Ge concentration deposited on monocrystalline MgO (100) substrates by magnetron co-sputtering are investigated using microstructural, morphological, magnetometric, and magnetic resonance methods. The films were found to grow epitaxially, with island-like or continuous-layer morphology depending the Ge-content. The ferromagnetic resonance data versus out-of-plane and in-plane angle indicate the presence of easy plane and 4-fold in-plane anisotropy. The magnetometry data indicate additional weak 2-fold in-plane anisotropy and pronounced at low fields rotatable anisotropy. The observed magnetic anisotropy properties discussed in correlation with the microstructure and morphology of the films
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